SMIC's third-gen 7nm node shows smaller metal pitch than Intel 18A, higher transistor density than TSMC N6 without EUV — analysis of N+3 shows significant advancement for Chinese semi manufacturing

SMIC.

An analysis of Huawei's Kirin 9030 system-on-chip (SoC) for smartphones conducted by SemiAnalysis revealed that SMIC's third-generation 7nm-class fabrication technology (N+3) has smaller metal pitch than Intel's 18A fabrication technology and that China's leading foundry has managed to achieve transistor density on par with manufacturing process that rely on EUV lithography. But does this make SMIC's N+3 node as competitive as Intel's 18A or TSMC's N2 and N3? Not really.

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