Russia has unveiled a roadmap to develop its own lithography machines, aiming to create less costly and complex equipment than ASML's systems, according to CNews. These machines will use lasers operating at a wavelength of 11.2 nanometers instead of the standard 13.5 nm used by ASML. This wavelength will be incompatible with existing EUV infrastructure and require Russia to develop its own lithography ecosystem, which will likely take years, if not a decade or more.
