Lip-Bu Tan, chief executive of Intel, this week confirmed that the company had already begun to work on its 10A and 7A fabrication technologies that will succeed Intel's current-generation 18A and next-generation 14A production nodes sometime in the next decade. Both 10A and 7A processes will presumably be able to use ASML's EUV lithography tools with high numerical aperture optics (High-NA), which will first be used for 14A.
"Now I am starting to work 10A, 7A, the roadmap," said Lip-Bu Tan at JP Morgan's Global Technology, Media and Communications Conference. "People do not [simply] go to you, they are looking for the roadmap for the future. So we want to build a long-term business. […]."
