Intel explained the rationale behind its High-NA EUV strategy at its Intel Foundry Direct 2025 conference this week. Despite persistent questions around cost-effectiveness, Intel has championed its use of the new High-NA EUV chipmaking tool with its forthcoming 14A process. However, Intel has not yet fully committed to using the new tool in production, but it has an alternative production flow of its 14A node that uses standard Low-NA EUV as a backup plan.
Intel has already received a second high-NA EUV tool, installed in its Oregon fab, and the company says the technology is progressing well. However, due to continuing development, the ~$400 million ASML Twinscan NXE:5000 High-NA EUV machines haven’t been used in a production environment yet, so Intel isn’t taking any risks.
