
Rapidus plans to install as many as 10 EUV lithography tools into its upcoming fabs in Japan, reports TrendForce, citing Nikkan Kogyo Shimbun. The tools will be used for mass production of chips on 2nm-class process technology starting in 2027.
Rapidus plans to install 10 EUV lithography machines in its IIM-1 and IIM-2 semiconductor production facilities, according to Atsuyoshi Koike, the chief executive, who spoke with Nikkan. In December 2024, the first EUV lithography equipment for Japan arrived at New Chitose Airport, marking a key milestone in Rapidus's development and the revival of the Japanese semiconductor industry.