Intel will be the first company to get an extreme ultraviolet (EUV) lithography tool with a 0.55 numeric aperture (high-NA) from ASML this year and it's also going to obtain the majority of the company's machines in 2024, according to a report by TrendForce. These tool procurement tactics indicate that Intel is poised to use Twinscan EXE machines extensively, going forward.
Intel is about to get its first Twinscan EXE:5000 pilot scanner from ASML and plans to use it to learn how to better use high-NA EUV lithography for commercial production of chips. The company initially planned to use this litho technology for its Intel 18A (18 angstroms, 1.8nm-class) production node to print the smallest features possible, but instead opted for EUV multi patterning as high-NA tools are coming later than expected.
