
Researchers from the Chinese Academy of Sciences (CAS) have created a "breakthrough" solid-state deep ultraviolet (DUV) laser emitting coherent 193-nm light used for semiconductor photolithography in a lab, reports the International Society for Optics and Photonics (SPIE).
If the light source technology can be scaled, this device could be used to build lithography tools that make chips using advanced process technologies. However, perspectives on scaling solid-state lasers are unknown.