ASML on Thursday announced that it had begun shipping the industry's first extreme ultraviolet (EUV) lithography tool with a 0.55 numerical aperture (High-NA) to Intel. The initial High-NA machine will be used to learn how it works on Intel's 18A (18 angstroms, 1.8nm-class) fabrication process, which promises to provide the CPU giant a lead over its rivals TSMC and Samsung.
"We are shipping the first High NA system and announced this in a social media post today," a spokesperson for ASML said. "It goes to Intel as planned and announced earlier."
