
ASML has announced that its first extreme ultraviolet (EUV) lithography tool with projection optics featuring a 0.55 numerical aperture (High-NA) has printed its first patterns. The announcement is a major milestone for both ASML and for High-NA EUV lithography technology in general.
"Our High-NA EUV system in Veldhoven printed the first-ever 10 nanometer dense lines," a statement by ASML reads. "Imaging was done after optics, sensors and stages completed coarse calibration. Next up: bringing the system to full performance. And achieving the same results in the field."