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Tom’s Hardware
Tom’s Hardware
Technology
Anton Shilov

ASML sets density record with latest chipmaking tools — High-NA EUV equipment prints first patterns

ASML.

ASML has announced that its first extreme ultraviolet (EUV) lithography tool with projection optics featuring a 0.55 numerical aperture (High-NA) has printed its first patterns. The announcement is a major milestone for both ASML and for High-NA EUV lithography technology in general. 

"Our High-NA EUV system in Veldhoven printed the first-ever 10 nanometer dense lines," a statement by ASML reads. "Imaging was done after optics, sensors and stages completed coarse calibration. Next up: bringing the system to full performance. And achieving the same results in the field."

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