Extreme ultraviolet (EUV) lithography is vital for modern process technologies and semiconductor manufacturing for years to come. However, at 1,400 kilowatts per EUV tool — enough to power a small city — EUV lithography systems have become a substantial consumer of power that impacts the environment. TechInsights believes that the power consumption of all fabs equipped with EUV tools will exceed 54,000 gigawatts (GW) of power per year by 2030, which is more than what many countries, like Singapore or Greece, consume per year.
Current Low-NA EUV scanners require up to 1,170 kW, and next-gen High-NA tools are projected to need as much as 1,400 kW per unit (according to TechInsights). The number of these machines installed at fabs operated by Intel, Micron, Samsung, SK hynix, and, of course, TSMC, increases every year.
